South Australian Node

Specific capabilities: micro and nano scale patterning; microfluidic device fabrication

The ANFF SAnode, NanofabricationSA within The WarkTM at the University of South Australia. The facility is focused on the design and fabrication of microfluidic chips and micro engineered structures which are tailored to the needs of Australian and international researchers.  The latest fabrication tools and a wide range of surface modification and functionalisation techniques available at The Wark, facilitate the production of next-generation microfluidic chips and devices with enhanced performance, through precise tailoring of microchannel surface chemistry.

The node provides access to three main capabilities:

  1. Microfluidic Fabrication Facility for prototyping and replication of channels and networks at the micro-scale. The facility comprises a dedicated clean room, equipped for surface preparation and cleaning, thin film deposition, micrometer scale photolithography, etching, surface characterisation and evaluation. Applications include lab-on-a-chip (with continuous flow chemical operations and extraction. Reaction rates 100 to 1000 times faster than during conventional processing), solvent extraction, pigment processing, genome research, pharmaceutical development and manufacturing.
  2. Surface Treatment Facility for chemical and physical modification using functional molecules to tailor microfluidic devices and various other surfaces for end user applications.
  3. Patterning and Texturing Facility for patterning and machining of various substrates, including silicon and glass, The facility is able to couple lithographic and direct write techniques depending on end user applications. Spatially controlled deposition is critical in the fields of fluidic and electric circuitry, responsive surfaces and other interfaces in advanced manufacturing.


More detailed information can be found at 


Contact Details

Facility Manager: Simon Doe
Phone: 08 8302 5226

Node Director: Prof. John Ralston
Phone: 08 8302 3066

Instrumentation Available

  • Spin coater
  • Mask aligner with nanoimprint lithography (NIL) function
  • Substrate bonder with hot embossing capability
  • Deep Reactive Ion Etcher
  • Wet etching station
  • CNC Micromilling station
  • Profilometer
  • Plasma cleaner

















Funding Sources